Erik Vermeulen


Accelerating particle defectivity analysis ​by combining Scattermetrology & SEM-EDX​

Fastmicro presents a technical study (a collaboration with Thermo Fisher Scientific) that demonstrates a >20x cycle-time increase in particle characterization on a Phenom SEM-EDX in combination with Fastmicro particle measurement data. This is achieved by combining single FOV scattermetrology rapid particle detection and localization with SEM-EDX’s characterization capabilities. This accelerated workflow enables on-the-spot particle contamination root-cause analysis, promising significant efficiency improvements for instance in the lithography supply chain, which are required to provide validated ultra-clean parts for Grade-1 manufacturing environments.

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