Speaker

Next generation of automation in wet processing

Challenges and advantages of a fully automated batch tool for high throughput
Why is a next generation of automation in wet processing necessary?
Requirements and principles of any semiconductor production, like maximum yield achieved by maximum automation and productivity on a small footprint, saving space and costs, or minimal clean room intervention while tool set-up, push us to develop new technologies.
In this presentation we will show our next generation fully automated batch tool for high throughput, the challenges as well as advantages for fabs. It’s a mixture of fully automated hardware and cutting-edge software solutions. A particular highlight is the robot cell with its connection to the OHT, high number of storage locations, wafer handling, LMC buffer station and more.