SONOSYS® is specialized in the development, manufacturing and distribution of highly sophisticated Ultrasonic/Megasonic systems for single-wafer and batch processes, in the frequency range from 400 kHz to 5 MHz.
SONOSYS® Ultrasonic/Megasonic systems provide highly efficient removal of particles down to the nanometer range from substrates with fragile surfaces, such as Wafers, Flat Panel Displays, Masks or Micro Systems.
Our main markets:
- Semiconductor
- Micro/Nano Technology
- MEMS
- Photovoltaics
- Optical Industry
- Food Industry
- Sonochemistry
- Research Institutes
Our main applications:
- Particle Removal
- SC1 Cleaning
- Resist Removal
- Wet Etching
- Post CMP Cleaning
- Acoustical Chemical Enhancement
Available SONOSYS® systems:
- Transducer plates
- Submersible transducers
- Face-to-face transducers
- Megasonic single/dual nozzle
- Shower nozzles
- Megasonic generators
- Atomizers